4th International Conference on Photoalignment and Photopatterning in Soft Materials
WelcomeOrganizing CommitteeProgram CommitteePhoSM 2023 ProgramProgramPhoSM 2020 Program HighlightsHotelTravelPrior conferencesAbstract SubmissionRegistration
Program Committee
Nelson Tabiryan, Chairman
BEAM Engineering for Advanced Measurements Co.
Orlando, Florida, USA
Martin Schadt
Switzerland
Antonio Ambrosio
Harvard University
Cambridge, Massachusetts, USA
Arri Priimägi
Tampere University
Tampere, Finland
Atsushi Shishido
Tokyo Institute of Technology
Tokyo, Japan
Guofu Zhou
South China Normal University
Guangzhou, P.R. China
Hoi Sing Kwok
Hong Kong University of Science and Technology
Hong Kong
Marina Grenzer (Saphiannikova)
Institute of Theory of Polymers, Leibniz Insitute of Polymer Research
Dresden, Germany
Masanori Ozaki
Osaka University
Osaka, Japan
Takahiro Seki
Nagoya University
Nagoya, Japan
Timothy J. Bunning
Air Force Research Laboratories
Wright Patterson Air Force Base, Ohio, USA
Timothy J. White
University of Colorado
Boulder, Colorado, USA
Vladimir Chigrinov
Foshan University
Foshan, Guangdong, P.R. China
Yan-qing Lu
Nanjing University
Nanjing, P.R. China